Pellicle Mounter

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APM-6200D

  • 반도체 Wafer용 Photo Mask에 Pellicle을 자동으로
    정밀하게 접착.
  • Photo Mask를 자동 Align하여 Pellicle Shift 최소화.
    (Vision System)
  • Mounting 공정을 미세 조정하여 Mask Registration
    (PID) 향상.
  • Photo Mask 및 Pellicle를 Loading/Unloading.
    (Clean Robot 사용)
  • Pellicle Mounting 압력을 균일하게 전달 및 표시.
  • Photo Mask는 OHT 장치를 통해 장비 공급 가능.
  • 15개의 Pellicle Stocker기능으로 편의성 & 생산성 향상.

SPECIFICATION

Dimension (mm) 2600 (W) x 1800 (D) x 2430 (H)
Weight (kg) Approximately 1700 kg
Pellicle Shift≤ 100 ㎛
Pellicle Rotation ≤30 ㎛
Mounting Pressure 0.3~30 kg
Mounting Time 1~9999 sec
Mounting Speed 0.1~1000 mm/min
Mounting Method - Mask Auto Align
- Control Mounting Pressure & Position & Speed
Equipment Condition - Auto-align function by a vision system
- Mask Barcode & Pod RFID Reading
- Mask Auto Rotation : 0° , 90° , 180° , 270°
- Edit Recipe & Process Log Save
- GEM300 Communication Application
- PLC Control
- 2 PC Operation (HMI)
- CCTV Recorder (4ch, about 20days save)
- Pellicle Stocker : 12ea~15ea Pellicle Stock
- Mask Transfer : 6 Axis Clean Robot
- Pellicle Transfer : 4 Axis Clean Robot
- Load Port : 2 Port
- Pod Load/Unload : OHT (E84 Application)
- ULPA Filter
- Equipment Safety : CE or S2, S8 Certification
Option - Chemical Filter
- Ionizer System
Utility - Power : 1Phase AC200~220V, 50/60Hz
- CDA : ¼” (0.5~0.7 Mpa)
- Exhaust : Φ100 mm ( >300 Pa)