Pellicle Demounter

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APD-6000S

  • 自动去除半导体Wafer用 Photo Mask上Pellicle。
  • 完全去除Pellicle Shift (500㎛) Mask。
  • Demounting 后自动摄影Pellicle Adhesive Residue
    32 points。
  • 精密控制Pellicle Demounting Pressure。
  • 6” Photo Mask 专用设备。
  • 选项 : SMIF。(Photo Mask Loading/Unloading)
  • SPECIFICATION

    Dimension (mm)1200 (W) x 1060 (D) x 2080 (H)
    Weight (kg)Approximately 650 kg
    Demounting Accuracy500 ㎛
    Demounting Torque0.3~15 kg
    Demounting Time1~9999 sec
    Demounting Temperature25~200 ℃
    Demounting Method

    - Mask Heating

    - Control Demounting Pressure & Range & Speed

    - Auto-align Pellicle & Mask Clamping

    - Auto Measuring Pellilce Adhesive Image by a Microscope system

    - Upper Direction Demounting

    Equipment Condition

    - Mask Barcode & Pod RFID Reading

    - Edit Recipe & Process Log Save
    - GEM300 Communication Application
    - PLC Control
    - PC Operation (HMI)
    - CCTV Recorder (4ch, about 20days save)

    - 6" Photo Mask

    - Equipment safety : CE or S2,S8 Certification

    Option

    - ULPA Filter

    - Chemical Filter
    - Ionizer System

    - SMIF System  

    Utility - Power : 1Phase AC200~220V, 50/60Hz
    - CDA : ¼” (0.5~0.7 Mpa)
    - Exhaust : Φ100 mm ( >100 Pa)